LW Microsystems (United States)

The concept of dual layer pattering as an alternative to POR in interconnect formation has been evaluated on maskless exposure technology. The novel dielectric materials negative tone PBO were used for the concept prove. The process optimization was conducted by varying the exposure and spin coating paraments. The lowest feature size accomplished was even <4 μm proving the two–step structures with FT of the first layer 50% of the dual layer FT. This new concept represents contribution to the improved CoO setup in the advanced packaging processes.

Construction professionals have started exploring several UAS configurations and techniques to ideally enhance the quality of the UAS-derived point clouds. This study aims at evaluating the factors [i.e., single-frequency GPS (L1), dual-frequency GPS (L1/L2), post-processing kinematic (PPK) georeferencing technique] affecting the accuracy of UAS-derived point clouds. Results showed that the use of a customized UAS that is equipped with dual-frequency GPS (L1/L2) and subject to PPK coordinate correction improved the overall point cloud accuracy. The outcome of this study is expected to benefit both practitioners and researchers in better understanding the effects of the system on the resulting point cloud accuracy.

We successfully fabricated two lots of micromirror devices. Each device consisted of a fused silica substrate, a substrate grid layer, a micromirror array layer, a dielectric membrane layer, and a top electrode layer (patterned with collector grid and vent hole only). Each micromirror array contained 1920×1536 mirrors, corresponding to resolution of 1920×1536. The process approach was repeatable, and reliable. Optical microscopy showed that the micromirrors were suspended above the glass panel by mirror post regions. The membrane was suspended above the substrate panel and above the array of micromirrors by membrane post regions. Micromirrors were flat and clean.

Władysław Opolczyk jest postacią kontrowersyjną, wzbudza sympatię, ponieważ jest fundatorem obrazu Matki Boskiej Częstochowskiej na Jasnej Górze, ale jeszcze więcej wzbudza animozji ze względu na swoją wrogą działalność polityczną wobec Polski. Dotychczasowe opracowania i opinie o księciu opolskim wyrażone w literaturze historycznej wymagają świeżego spojrzenia na jego postać, aby wyjaśnić jego działalność polityczną i kościelną w Polsce. To stanowi podstawowy problem niniejszej pracy bez pretensji wyczerpania tematu.