- Research Article
- 10.1051/jp4:1998327
SiGe HBT simulation based on m<sub>p</sub>* (T, N<sub>A</sub>, x<sub>GE</sub>) numerical model HEM
- Jun 01, 1998
- Le Journal de Physique IV
- S Sokolic + 2 more +2
Modeling of effective densities of states N V,SiGe in heterojunction bipolar transistor is presented, based on accurate determination of hole effective mass m p * . Algorithm for calculation of hole effective mass m p * is presented, which is optimized for numerical device modeling. Corresponding Fortran subroutine named HEM is discussed, which calculates hole effective mass in the temperature range of T=77K-300K, base doping level bellow 10 20 cm -3 and germanium content x Ge =0,00-0,30. Finally, Fortran subroutine HEM is incorporated into numerical device simulator MEDICI and tested through simulation of idealized heterojunction bipolar transistor.
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