- Conference Article
- 10.1117/12.3092943
Development of high-performance NTD developers via HSP-assisted HTE
- Dec 03, 2025
- Huawei Zhou + 3 more +3
The relentless drive toward smaller semiconductor nodes demands advanced lithographic materials with exceptional resolution, sensitivity, line-edge roughness (LER), and defect control. Negative Tone Development (NTD) processes offer unique advantages for specific patterning applications. To circumvent the RLS trade-off, co-optimization of both the exposure and the development spaces is essential. We systematically explore the NTD developer formulation dimension besides the photoresist-formulation-related exposure space, leveraging advanced computational and machine learning tools. In this presentation, we will present our recent progress and results on the development of high-performance NTD developers via high-throughput experimentation (HTE) utilizing Hansen-solubility parameters (HSP) as a pivotal gauge.
Read more