Osmic Enterprises (United States)

El presente artículo forma parte de un estudio mayor desarrollado en el marco de una tesis doctoral, en la que se ha trabajado con los datos de la prueba de evaluación nacional simce 2011. El estudio que aquí se presenta aporta datos que señalan la importancia que las competencias socioemocionales tienen para el desarrollo personal, académico y profesional del alumno y del docente en una sociedad que demanda nuevas competencias sociales y laborales. A partir de la idea de que no es posible enseñar competencias que previamente no se han alcanzado, se reitera la necesidad de incorporarlas en los planes de formación inicial y de desarrollo profesional docente, así como la conveniencia de su evaluación con adecuados instrumentos de medición.

A Revista Ibero-americana de Educação, em seu afã por promover e articular espaços de análises, pesquisa, difusão e reflexão sobre a ação educativa na América ibérica, decidiu dedicar seu monográfico nº 61 ao tema: «Cooperação educativa ibero-americana». Este número pretende ser mais um instrumento de apoio às Metas Educativas 2021, iniciativa de cooperação compartilhada pelos países ibero-americanos com a finalidade de alcançar uma educação que dê resposta satisfatória a demandas sociais inadiáveis: conseguir que mais alunos estudem, por mais tempo, com uma oferta de qualidade reconhecida, equitativa e inclusiva, e na qual participe a grande maioria de instituições e setores da sociedade [...]

A simple analytical approach is given to calculate the performance of parabolic mirrors for various wavelengths. Expressions are given for the efficiency of the parabolic mirror system and insertion gain. As examples, parameters for some mirrors for CuKα and MoKα radiation are calculated.

Molybdenum/Silicon soft x-ray optical coatings for extreme ultraviolet lithography are being developed for both projection optics and masks, and have only recently been produced on a production scale via magnetron sputtering. A number of critical factors must be met for successful development of these coatings for implementation into commercial EUV Lithography. We report on our results for several factors with a state-of-the-art in-line sputtering system. All coatings in a lithography system must match to obtain maximum energy transmission. Hence, process repeatability and characterization of the reflectivity and central wavelength is essential. Run-to-run performance and substrate uniformity is shown to have achieved less than 1% deviation in soft x-ray central wavelength between any two points on any two substrates coated in separate batches; coating uniformity on a given wafer is on the order of 0.3% total deviation. Hard x-ray measurements of d-spacing and reflectivity were correlated to soft x-ray measurements; these correlations were used to improve process control. Furthermore, the coatings must be as defect-free as possible; elimination of aerosol-based particulate generation has allowed improvements by nearly four orders of magnitude. Finally, efforts to understand and control coating stress as a function of processing parameters and post-coating annealing schedules will be reviewed. Results of the effects of deposition method, ion bombardment and interactions between sputter power, sputter pressure and deposition rate are reviewed.

We are developing depth-graded, multilayer-coated mirrors for astrophysical hard x-ray focusing telescopes. In this paper, we discuss the primary technical challenges associated with the multilayer coatings, and report on progress to date. We have sputtered constant d-spacing and depth-graded W/Si multilayers onto 0.3 - 0.5 mm thick DURAN glass (AF45 and D263) and 0.4 mm thick epoxy replicated aluminum foils (ERAFs), both of which are potential mirror substrates. We have characterized the interfacial roughness, uniformity, and stress of the coatings. The average interfacial roughness of each multilayer was measured from specular reflectivity scans ((theta) <SUB>i</SUB> equals (theta) <SUB>r</SUB>) using Cu K<SUB>alpha</SUB> x-rays. The thin film stress was calculated from the change in curvature induced by the coating on flat glass substrates. Thickness and roughness uniformity were measured by taking specular reflectivity scans of a multilayer deposited on the inside surface of a quarter cylinder section. We found that interfacial roughness ((sigma) ) in the multilayers was typically between 3.5 and 4.0 angstrom on DESAG glass, and between 4.5 and 5.0 angstrom on the ERAFs. Also, we found that coatings deposited on glass that has been thermally formed into a cylindrical shape performed as well as flat glass. The film stress, calculated from Stoney's equation, for a 200 layer graded multilayer was approximately 200 MPa. Our uniformity measurements show that with no baffles to alter the deposition profile on a curved optic, the layer thickness differs by approximately 20% between the center and the edge of the optic. Interfacial roughness, however, remained constant, around 3.6 angstrom, throughout the curved piece, even as the layer spacing dropped off.