Pharmbio Korea (South Korea)

Abstract The aim of the research is to assess the transfer of docosahexaenoic (DHA) and eicosapentaenoic (EPA) into cow's milk following supplementation with rumen protected fat supplements (rumen protected omega fat, RPOF). In pasture based and in feed‐lot management systems the transfer of DHA and EPA is 19–20% following supplementation with equal proportions of DHA and EPA (20–25 g/cow/day); the DHA and EPA level in milk are at 0.4% of the total fatty acids for each. There is no change in milk yield, protein, and fat content after 60 and 105 days of RPOF supplementation in pasture based and lot fed cows, respectively. The transfer of DHA into milk fat is around 25–32% when RPOF containing higher proportions of this fatty acid are fed (40.8 g/cow/day) and the DHA content in milk is about 1% of the total fatty acids.Practical Applications: Significant quantity of omega 3 DHA and EPA can be transferred into cow's milk in pasture based and feedlot management systems, and there is no reduction in milk yield, fat, and protein content. Furthermore, omega 3 milk with varying proportions of DHA and EPA can be produced in different dairy enterprises.

In this paper, an Energy Intensity Distribution (EID) model considering dose latitude for Variable Shaped Beam (VSB) has been developed. η values (i.e. back-scattering ratio) versus dose and process threshold have been investigated by using the EID model. Additionally, a new procedure to find optimum PEC values (η) taking into account of the process threshold is proposed through simulation. For fogging effect correction, we have adopted a Gauss model and created a new simulation algorithm to find the most suitable parameters regarding η value, process threshold, dose and the EID model.

The selectivity and etched profile of MoSiON in high-density CF₄/O₂/He inductively coupled plasma (ICP) have been studied. The etched profiles of MoSiON along with the quartz surface morphologies were investigated as a function of etching parameters by scanning electron microscopy (SEM). We varied pressure from 5 mtorr to 20 mtorr and CF₄flow rate from 15 sccm to 40 sccm. A smooth quartz surface and a vertical MoSiON slope were observed under 10 sccm CF₄, 15 sccm of O₂ flow rate, -240 V of DC bias and 5 mtorr pressure. And the other conditions showed rough quartz surface and bad MoSiON slope. Only at the appropriate CF₄/O₂ Flow rate, high vapor pressure compounds inhibits nonuniform quartz etching.

A method of PSM cleaning has been developed and its cleaning performance was studied by changing H 2 SO 4 / H 2 O 2 mixture(SPM) and diluted standard cleaning-1 (SC-1) chemical ratio and controlling phase and transmittance of KrF HT PSM, within ±3° and ±0.3 percent respectively. The type of residue was scrutinized using KLA-Tencor SL3UV and scanning electron microscopy (SEM) during stepwise process and cleaning. X-ray photoelectron spectroscopy (XPS) was also employed to characterize the residues on the HT PSM surface. Diluted HF (DHF) and DHF/H 2 O 2 mixture (FPM) were introduced to etch off the remaining defects on quartz after MoSiON dry etch process and also compared their results with the gas assisted etching (GAE) repair. It has turned out that DHF, FPM and GAE repair removed the remaining defects on quartz respectively. Our results demonstrate that approach of stepwise process inspection is very effective at identifying defects and their sources as they become evident at different process steps. Finally it was shown that diluted SC-1 with quick dump method followed by the direct displacement IPA dry is promising for the improvement of HT PSM cleaning efficiency and its residual impurities and causes no damage on the MoSiON surface. It is found that efficient and effective conventional chemical treatment, direct displacement IPA dry and GAE repair would be considered to be the integrated sequence to control the smallest particles for the HT PSM.