- Research Article
- 10.4071/001c.156295
Plasma Engineering of Materials for Power Electronics Packaging
- Feb 05, 2026
- IMAPSource Proceedings
- Daphne Pappas + 5 more +5
Traditionally, wet chemistry processes and vacuum-based gaseous plasmas have been used for the preparation of surfaces and production of functional coatings used in electronics packaging. While these methods have been widely used and accepted in industry, there is always a need for high throughput, lower cost, vacuum-free processes that can produce thin coatings that enhance the performance and longevity of the devices. This talk will provide a step-by-step introduction to the critical steps involved in the preparation of the materials used in power electronics packaging and demonstrate the effect of atmospheric-pressure based plasmas on improving their quality. Starting from the base substrate, results showing the effect of air plasmas on the cleaning and activation of FR4 board materials will be discussed, while the removal of copper oxides from Cu substrates using nitrogen/hydrogen plasmas will be presented. Moving to the next level, the deposition of functional nanocoatings having a thickness range between 15nm and 2µm, produces adhesion promoting layers to epoxy mold compounds (EMC) and electromagnetic interference (EMI) blocking coatings. The organo-silicon chemical structure of the coatings provides improved mechanical hardness, thermal, and electrical insulation compared to pure polymer coatings such as acrylics, without requiring the application of thick layers. Data from the characterization and functional testing of these coatings will be shown, revealing the potential for their use in high volume manufacturing in the electronics industry.
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