TIE Kinetix (Netherlands)

Personal Informatics (PI) systems, such as apps and wearables that help users track physical activity, sleep, heart rate, or stress, have become critical tools for self-monitoring and health research. As these systems increasingly drive personal and clinical decisionmaking, it's vital to understand how equitable and representative they really are. Real-world harms have already surfaced in adjacent domains: health sensors like pulse oximeters underperform on darker skin tones [1], and female speakers and non-US nationalities experience significant performance degradation in automated speaker recognition [2]. These failures aren't just technical - they're structural, human-centric, and societal. Yet, despite their growing influence, PI systems remain critically under-researched from a fairness and equity perspective [3]. Our research, detailed in [4], investigates this question by examining when, how, and for whom bias arises in the lifecycle of PI systems.

Waste material processing and wholesale markets provide work for children in the informal commercial and service sector in urban areas. Approximately 60% of the economically active population in Lima Metropolitan Area is involved in the informal sector, which also absorbs the majority of working children in Peru (Espinoza and Rios 2006). It is estimated that approximately 30% of the children work in cities (Cesip 2007).

Reported is a summary of the development of EUV Mo/Si multilayer coating technology. Though the results are developed for application in Extreme Ultraviolet Lithography, they are of a broader relevance including optics for astronomy. The coating process used consists of electron beam evaporation in combination with low energy ion beam smoothening. The radiation hardness of these coatings is discussed and methods to reduce the multilayer induced substrate stress. The reflectance of the coatings, which are covered with a special protective capping layer, is typically around 65%, while the non correctable figure error added by the full multilayer stack is controlled to better than 15 picometer.

Earth observation satellites are commonly equipped with an on-board diffuser. Their use will be pointed out and the errors associated with their use will be explained. The origin of the errors, the speckles formed by scattering on the diffusers, will be dealt with in detail and solutions to minimize these errors will be presented. The use of diffusers, and the types of diffusers will be discussed in combination with their ability to minimise the contrast of the spectral features.

With the future growing size of telescopes, new, high-resolution, affordable wavefront corrector technology with low power dissipation is needed. A new adaptive deformable mirror concept is presented, to meet such requirements. The adaptive mirror consists of a thin (30-50 μm), highly reflective, deformable membrane. An actuator grid with thousands of actuators is designed which push and pull at the membrane’s surface, free from pinning and piston effects. The membrane and the actuator grid are supported by an optimized light and stiff honeycomb sandwich structure. This mechanically stable and thermally insensitive support structure provides a stiff reference plane for the actuators. The design is extendable up to several hundreds of mm's. Low-voltage electro-magnetic actuators have been designed. These highly linear actuators can provide a stroke of 15 micrometers. The design allows for a stroke difference between adjacent actuators larger than 1 micron. The actuator grid has a layer-based design; these layers extend over a large numbers of actuators. The current actuator design allows for actuator pitches of 3 mm or more. Actuation is free from play, friction and mechanical hysteresis and therefore has a high positioning resolution and is highly repeatable. The lowest mechanical resonance frequency is in the range of kHz so a high control bandwidth can be achieved. The power dissipation in the actuator grid is in the order of milliwatts per actuator. Because of this low power dissipation active cooling is not required. A first prototype is currently being developed. Prototypes will be developed with increasing number of actuators.

A special case of optical aperture synthesis, homothetic mapping, is the topic of this paper. It allows for a wide field of view for interferometric instruments, interesting for astrometric measurments of wide objects. This paper describes a testbed constructed and tested in TNO-TPD in Delft (the Netherlands). This testbed is intended as a tool to investigate the ins and outs of homothetic mapping. The homothetic mapping approach is explained, the whole setup is specified and results are shown.

The LISA Technology Package (LTP) aboard of LISA pathfinder mission is dedicated to demonstrate and verify key technologies for LISA, in particular drag free control, ultra-precise laser interferometry and gravitational sensor. Two inertial sensor, the optical interferometry in between combined with the dimensional stable Glass ceramic Zerodur structure are setting up the LTP. The validation of drag free operation of the spacecraft is planned by measuring laser interferometrically the relative displacement and tilt between two test masses (and the optical bench) with a noise levels of 10pm/[square root of]Hz and 10 nrad/[square root of]Hz between 3mHz and 30mHz. This performance and additionally overall environmental tests was currently verified on EM level. The OB structure is able to support two inertial sensors ([approximate]17kg each) and to withstand 25 g design loads as well as 0...40°C temperature range. Optical functionality was verified successfully after environmental tests. The engineering model development and manufacturing of the optical bench and interferometry hardware and their verification tests will be presented.

A polishing robot, using the fluid jet polishing technique (FJP), in combination with in-situ monitoring systems will be presented. One of the monitoring systems is used to check the surface roughness, while the other checks the local removal. Owing to this removal monitoring system the presented system is ideally suited for corrective polishing applications where normally a time consuming iterative approach would be required.

The Ozone Monitoring Instrument (OMI) is a UV/VISible spectrograph (270 - 500 nm). It employs two-dimensional arrays of CCD detectors for simultaneous registration of numerous spectra from ground pixels in the swath perpendicular to the flight direction. As a result, OMI provides (almost) daily global coverage in combination with small ground pixel sizes (nominally 13 X 24 km<SUP>2</SUP> at nadir, minimum 13 X 12 km<SUP>2</SUP> at nadir). The small ground pixels allow retrieval of tropospheric constituents. The OMI Flight Model is currently being integrated and will be launched on the Aura satellite in2003 as part of NASA's Earth Observing System. This paper discusses relationships between and the details of the on-ground calibration approach of OMI, the data processing of level 0 data (raw data) to level 1b data (geophysical data) and the foreseen activities for in-flight calibration.

The light source is a critical factor when Extreme Ultra Violet Lithography (EUVL) is used. This paper shows the link between the light source and the customer's requirements. These are: Throughput, Cost of Ownership (CoO) and imaging quality (e.g. CD uniformity). Also shown is how customer requirements dictate the necessary performance specifications for light sources. To be competitive with other New Generation Lithography technologies, EUVL tools should show a potential for high throughput. This puts a high requirement on the collectable in-band power produced by an EUV source. CD control requirements, together with restrictions of reflective optics, are discussed. This means that the pulse-to-pulse repeatability, the spatial stability control and the repetition rates, must be substantially better than those of current optical systems. It is essential, in the early stages of the development of potential light sources, to understand the source limitations. It is also essential to see the way the light source or the total source/lithographic system could be improved, in the development time, to meet the lithography tool requirements. Although there are no light sources currently under development that comply with the requirements for an EUVL production tool, future improvement in the performance of light sources seems possible. This paper shows detailed analyses of the way to meet (beta) and production tool requirements, including the increase in repetition rate, for all of the sources. The decrease in energy per pulse will also be discussed. The performance requirements for the light source for the first lithographic tool, together with the timeline for its choice, will be shown.