Ulefos Esco (Norway)

El autor del artículo que se presenta inicia con un análisis conceptual del bullying o acoso escolar y reflexiona sobre el papel de las Instituciones del Estado mexicano que están involucradas en la violencia escolar. Además, el investigador hace un breve repaso al marco jurídico aplicable y a los compromisos internacionales asumidos por México; para posteriormente concentrar su labor en el tema de la previsión, que considera debe ser desarrollada específicamente por la administración pública federal. Destaca lo correspondiente al tema del acoso escolar en el nivel de la educación básica, es decir, en preescolar.

Abstract Volvo Aero Norway (VAN) is a manufacturing company specializing in the production of high precision aerospace components for both commercial and military jet engines. VAN has, as a high‐end production company, a highly diverse set of stakeholders in their employees, customers and suppliers. It is therefore a definite need for VAN to have personnel that can communicate efficiently between stakeholders to be able to complete projects and optimize production in order to sustain their competitive position.Using systems modeling is a known technique to aid communication, raise understanding and create debate surrounding any given system of interest. By measuring the value, in regards to the aforementioned effects of modeling, of the work being performed at VAN we can discuss the usefulness of modeling‐based communication. We will examine the connection between a stakeholder's distance to a given system and the optimal level of modeling detail and novelty.In this paper, we will discuss model effectiveness based on balancing impact factors based on stakeholder's system proximity. We will classify and evaluate models in a 2D‐Matrix and present recorded trends at VAN.

Ultra-high-vacuum thermal desorption mass spectroscopy has been newly constructed for VLSI material and processes characterization. A combination of the load-lock system and direct heating method using an external infraed lamp enabled rapid measurements (typically less than 1 hour/sample) and accurate ramp heating ranging from 6 to 300 deg/min, up to 850°C without significant background increases. The detection limit of desorbed gas was found to be approximately 1/20 monolayer on Si surfaces even for H2 and H2O. Its applicability to VLSI Characterization has been demonstrated by studying the outgassing and chemical structures of interdielectric films, surface structures of cleaned Si wafers, and CF4/CHF3 plasma-exposed Si surfaces. It is concluded that this system has the potential to play a key role in not only surface analysis but also the development and optimization of VLSI materials and processes.