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All‐Solution‐Processed Micro/Nanowires with Electroplate Welding as Transparent Conducting Electrodes

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Abstract

In article no. 1900010, Chaobin Yang, Michael J. Naughton and co-workers demonstrate two variants of an all-solution method to produce silver micro/nanowire films as transparent conductors. By integrating crackle photolithography-based microwires with nanowires and electroplate welding, the authors obtain transparent conductors with low sheet resistance (<1 ohm/sq.), high optical transmittance (>80%) and small domain size (∼10 μm2). It is shown that the samples can be transferred to flexible substrates, making a possible cost-effective candidate for flexible applications. The cover picture shows a photograph of an all-solution-processed micro/nanowire transparent conducting electrode on 100 mmdiameter glass, held in front of a building. Bottom left: Scanning electron microscopy (SEM) image of the silver micro/ nanowires, bottom right: SEM of a junction between two nanowires after electroplating.

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