11- https://doi.org/10.1109/icmts48187.2020.9107905
Comparison of cut-back method and optical backscatter reflectometry for wafer level waveguide characterization
- May 1, 2020
- Anna Peczek +3 more
Abstract
The optimum optical characterization method suitable for wafer level waveguide testing is an important issue for silicon photonic methodology. In this paper we focus on comparing the two most widespread measurement techniques: cut-back and optical backscatter reflectometry.
- # Optical Backscatter Reflectometry
- # Optical Reflectometry
- # Characterization Method
- # Comparison Of Method
- # Optical Method
- # Optimum Method
- # Optical Characterization Method
- # Backscatter Reflectometry
- # Cut-back Method
- # Optical Backscatter
