- Research Article
20
- 10.1016/0040-6090(96)08669-5
The structural characteristics of VO x films prepared by He-introduced reactive RF unbalanced magnetron sputtering
- Aug 01, 1996
- Thin Solid Films
- H Miyazaki + 3 more +3
The structural characteristics of VO x films prepared by He-introduced reactive RF unbalanced magnetron sputtering