Dry resist process optimization at the 0.33NA resolution limit and validation via large area e-test inspection

To achieve higher efficiency, turbomachinery components are often operated close to the thermal stress limits of the used materials. It is of great importance to have accurate knowledge of the temperature distribution across each part to ensure reliability and prevent material failure. Even small changes in temperature can significantly impact the service life. Therefore, precise measurement of temperature distribution on combustor and turbine components is crucial for the validation process of turbomachinery. This can be achieved using irreversible thermochromic paint. It reacts sensitively to temperature and time, altering its colour, structure and shine. To avoid disassembling the engine for post-test component analysis, current research is enhancing the use of endoscopic imaging devices for diagnostics involving this thermochromic paint. However, challenges such as inconsistent illumination, limited resolution and failure to account for the paint’s structure and shine can significantly increase measurement uncertainty. This paper develops a methodology to reduce the measurement error. Firstly, it evaluates the failures associated with endoscope measurements, concentrating on geometrical distortion, colour fidelity and colour constancy. To facilitate this, endoscope images are taken in a test rig with standardised specimens under controlled conditions. Secondly, a correction methodology is developed and validated within a high-pressure turbine module. The correction methodology comprises of an optimisation of the image acquisition process and application of image processing algorithms and techniques. The proposed approach intends to enhance the analysis of temperature-sensitive paint measurements through endoscopic imaging, thereby improving overall process efficiency and contributing to safer product development.

A method for continuous 3D visualization of the mold filling at a microscopic level during athermoplastic nanoimprint process was developed. It is based on superposition ofmicrographs of a series of different stages of imprint. It was applied to two common3D microscopies with different resolution limitations. Due to advanced imageprocessing, the animated movie sequence, available as supplementary multimediainformation in the online version of this journal, gives an unprecedented insightinto the complex polymer flow and shows how voids are forming and vanishingduring the imprint process around micropillars. The method has advantages overcurrent real-time methods and can be used as an analytical tool for optimization ofprocesses and improvement of stamp design down to the sub-10 nm nanometer range.

As a design rule shrink down aggressively, various RETs (Resolution Enhancement Technology) have been developed to extend the resolution limits of lithography. Until now, next generation lithography has been focused on EUV technology. But no one can assure when EUV will be implemented. So, we must develop new technology with current immersion tool to catch up with aggressive design rule. One of those is DPT (Double Patterning Technology), however there are also many challenges to overcome such as patterning, overlay, hard mask etch and so on. The most critical issue would be overlay, because it affects CD (Critical dimension) uniformity directly. Therefore, overlay control is very important between 1 st DP layer and 2 nd DP layer. We utilized ArF immersion scanners for this experiment . In this paper, DP process flow, hard mask film dependency, align method dependency, efforts of new align key design and direct align analysis in DP overlay will be reported to understand and get better overlay accuracy than tool specification. It is needed to be verified that how much they take an effect on improving the DP overlay. Continuously we can conclude that most efforts in DPT should be focused on overlay control issue. KEY WORDS: Immersion, overlay, align, DPT (Double Patterning Technology)