- Conference Article
- 10.1109/icops37625.2020.9717739
Study of Slow Focus Mode Operation of Dense Plasma Focus Device for Ion Implantation
- Dec 06, 2020
- Mayank Mishra + 5 more +5
Dense Plasma Focus (DPF) devices are pulse plasma devices which are capable to generate few keV to MeV ions. The burst of energetic ions presents in plasma shots generated by DPF devices, can be used for impanation in the desired materials for various application from electronics to spintronics. Here, we present an advance way of gradient implantation using DPF in the heavy metal without much effecting the surface properties of the thin film. In order to implant desired ions such as oxygen, carbon, nitrogen, argon etc. new electrodes were designed, providing gentler plasma pinch phase, with increased plasma volume. To study the effect of the new electrode design electrical characteristics were performed in detail and with the help Lee code the plasma parameter like plasma temperature, plasma duration etc. was estimated. Optical imaging diagnostic (using gated ICCD camera), faraday cup measurements and x-ray pin-diode spectroscopy, was used to investigate the plasma dynamics, plasma density and plasma temperature. The designed electrode assembly can be used to generate defects and modify the material properties required for electronics, photonics and spintronics applications.
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