Fabrication of a uniform microlens array over a large area using self-aligned diffuser lithography (SADL)

Microlens projection lithography is a new lithography method that uses a microlens array with aperture stops to image a single pattern on a mask onto a resist layer, forming an array of the miniaturized pattern. However, the fabrication of a microlens array with aperture stops is complicated, time-consuming and requires expensive facilities. In this paper, we report a single-step fabrication method of plastic microlens arrays with aperture stops. By using gas pressure to hot press a stainless-steel shadow mask with a microhole array onto a thermoplastic film, the softened polymer material is partially filled into the holes of the shadow mask, and forms a convex surface due to surface tension. After cooling, while keeping the microlens array and shadow mask attached, a plastic microlens array with aperture stops is obtained. To verify its capacity, a microlens projection lithography facility has been designed, constructed, and tested. Arrays of µm-sized patterns have been successfully fabricated using transparency masks of a mm-sized pattern.

Shape-controlled microlens arrays fabricated by diffuser lithography

Tradition lithographic techniques to produce micrlens array are complicated and time consuming. Due to the capability to replicate nanostructures repeatedly in a large area with high resolution and uniformity, hot embossing has been recognized as one of the promising approaches to fabricate microlens array with high throughput and low cost. This paper introduces processes to realize fabricating microlens array in mass production by direct hot embossing on silicon substrate. The mold is fabricated by multi-photolithography and etching steps and polymethyl methacrylate (PMMA) is chosen as the resist. Processes include coating, heating, pressing, etc. Fidelity and optical performance of the embossed microlens array were measured. High fidelity and fine optical performance of the embossed microlens array demonstrate the possibility of hot embossing to fabricate microlens array in mass production.

This paper describes a simple and effective method to fabricate a plastic microlens array with controllable shape and high fill-factor, which utilizes the conventional lithography and plastic replication. The only difference from conventional lithography is the insertion of a diffuser that randomizes paths of the incident ultraviolet (UV) light to form lens-like 3D latent image in a thick positive photoresist. After replication of the developed concave microlens mold onto the polydimethylsiloxane (PDMS), the focal length of the fabricated hemispherical microlens was observed to be 13-88 microm depending on the UV exposure dose. Two PDMS curing conditions were tested, where the elevated temperature of 85 masculineC resulted in smoother surface roughness of 2.6 nm in RMS value in the microlens mold. The proposed method can be extensively applied for microlens fabrication with other plastic materials due to its simplicity and versatility.

Fabrication of PDMS microlens array by digital maskless grayscale lithography and replica molding technique

An optical head based on the Talbot effect with an aspheric microlens array for an optical read-only-memory (ROM) card system was designed and fabricated. The mathematical expression for the wavefield diffracted by a periodic microlens array showed that the amplitude distribution at the Talbot plane from the focal plane of the microlens array was identically equal to that at the focal plane. To use a reflow microlens array as a master pattern of an ultraviolet-imprinted (UV-imprinted) microlens array, the reflow microlens was defined as having an aspheric shape. To obtain optical probes with good optical qualities, a microlens array with the minimum spherical aberration was designed by ray tracing. The reflow condition was optimized to realize the master pattern of a microlens with a designed aspheric shape. The intensity distribution of the optical probes at the Talbot plane from the focal plane showed a diffraction-limited shape.

In this paper, we present a new roll-to-roll method to fabricate visible light transparent microlens arrays on a glass substrate by using soft and cost-effective polydimethylsiloxane (PDMS) molds. First, we fabricated microlens array master molds by photoresist thermal reflow processes on silicon substrates. We then transferred the pattern to PDMS molds by a spin coater. After making the PDMS molds, we used a two-wheel roll-to-roll printing machine to replicate ultraviolet resin microlens arrays on glass substrates. The PDMS molds can be made easily at a low cost compared with traditional electroplating metal molds. We studied the quality of microlens arrays that were replicated by different rolling pressures of 20, 200 and 500 N cm−2. We also identified the relation between the pressure and the shape of the microlens arrays. The results showed that the best yield rate and replication performance were achieved with a pressure of approximately 200 N cm−2 and 4 min of ultraviolet light exposure.

In this paper, we demonstrate the fabrication of refractive silicon microlens array with a large focal number and almost perfect spherical lens shape. Through a modified thermal reflow, photoresist microlens array of a large focal number is fabricated, which is then transferred into the silicon substrate by ion beam milling. To reach an accurate spherical lens profile, we both theoretically and experimentally study the practical factors that harm the pattern transfer fidelity, which mainly include the etching selectivity and faceting effect. Other secondary etching effects, such as the trenching effect and re-deposition effect, are also discussed. Based on these studies, a silicon microlens array with a focal number of 1.35 has been successfully obtained, with the profile error controlled well-below 0.121 μm, less than λ/6 within the whole infrared wavelength band. Besides, the fabricated microlens array exhibits a good uniformity and fine surface smoothness. The fabricated silicon microlens arrays can be applied in minatured infrared and terahertz imaging devices, or used as the master mould for soft lithography.

Hot embossing has been widely used in fabricating microlens arrays because of its low cost, high efficiency, and high quality. The process parameters such as molding temperature, molding pressure, and holding temperature affect the microlens array’s replication quality. This work selected the stainless steel S136H tool steel as the mold material to process an aspheric microlens array structure through ultra-precision milling. Polymethyl methacrylate (PMMA) microlens arrays with different surface replication were prepared by controlling the molding temperature, molding pressure, and holding temperature. By analyzing the surface quality, contour replication, and optical imaging of hot-embossed samples, the optimal molding temperature of PMMA for optimal replication of aspheric lens arrays was determined as 130 °C. Besides, the internal elastic recovery of PMMA affected the dimensional accuracy and optical performance of the lens. The results showed that, at the molding pressure of 400 N and the holding temperature of 60 °C, the surface defects were eliminated, and the aspheric lens array had perfect replication with a profile deviation of only 4 μm. The aspheric microlens array with good quality was eventually achieved by these optimal process parameters, which provides a foundation for producing aspheric microlens arrays in a low-cost and high-efficiency way.

Infrared charge coupled device (IRCCD) integration with microlens array is an effective method for improving the detecting sensitivity of IRCCD sensors. In this paper, we present the diffractive microlens array (MLA), which is manufactured by the submicron photolithography technology and magnetically enhanced reactive ion etching (MERIE) on infrared quartz substrate. The integration procedure between microlens array and PtSi Schottky-barrier IRCCD chip is introduced in detail. The optical response of IRCCD sensor with microlens array is tested and the average response increases 0.23 in the spectral range of 1.2∼5.0 μm. The measuring results show that the large-scale diffractive microlens array is able to improve the detecting sensitivity of IRCCD and that the integration technology mentioned is available.

Microlens arrays have been widely used as an essential component in many optical systems. The conventional fabrication techniques, such as ink-jet printing, photoresist thermal reflow, grayscale photolithography, and LIGA process have some drawbacks in aspects of process complexity and high fabrication cost. This paper presents a low-temperature, rapid and cost-effective method to successfully generate SU-8 microlens arrays on biocompatible Parylene-C surfaces. Vapor-induced SU-8 dewetting has been achieved on chemically modified Parylene-C surfaces that were selectively pre-treated with O(2) or SF(6) plasma. By this technique, the SU-8 droplets are self-organized onto desired positions to form a microlens array. This method is also suitable for production of microlens array on curved surfaces. The progress of dewetting has been studied by both experiment and simulation.

This work presents the fabrication of a high fill factor Fresnel microlens array (MLA) by employing a low-cost home-built maskless exposure lithographic system. A phase relief structure was generated on a photoresist-coated silicon wafer, replicated in Polydimethylsiloxane (PDMS) and electrostatically bonded to a glass substrate. Optical characterization was based on the evaluation of the maximum intensity of each spot generated at the MLA focal plane as well as its full width at half maximum (FWHM) intensity values. The resulting FWHM and maximum intensity spot mean values were 50 ± 8%μm and 0.71 ± 7% a.u , respectively. Such a MLA can be applied as Shack-Hartmann wavefront sensors, in optical interconnects and to enhance the efficiency of detector arrays.

An artificial neural network and genetic algorithm were used to achieve a high quality microlens array fabrication using a UV proximity printing process in this study. The UV proximity printing process can precisely control the geometric profile of the microlens array in the fabrication process without thermal reflow. The major objective in using the robust design is to reduce the variations in the focal length of the microlens array, allowing improved focus and enhanced illumination brightness. The artificial neural network was used first to characterize the nonlinear relationship between the manufacturing parameters and the properties derived from experimental data. The manufacturing parameters which affect microlens array uniformity include: (1) geometrical ratio, (2) printing gap, (3) spin coating revolution speed, (4) exposure time and (5) developing time. It is very important to control these parameters to decrease the sensitivity to noise. The L18 orthogonal array was used as the learning data for the artificial neural network to construct a system model that could predict the focal length for arbitrary setting of parameters. Then, the genetic algorithm was applied to obtain the robust setting of parameters. The results showed that the microlens array quality could be significantly improved in comparison with the original design.

Microlens arrays play a critical role in enhancing imaging systems due to their outstanding optical performance, compact size, and lightweight nature. However, traditional fabrication methods for microlens arrays suffer from low precision, inefficiency, high costs, and a lack of adequate surface figure control. In this paper, we present a novel approach for microlens array fabrication, using a projection lithography process with mask-shifting. The method employs a 0.2× projection objective lens to enhance linewidth resolution. By employing a projection-based mask-shift filtering technique, we achieve superior surface figure accuracy while reducing the complexity of mask preparation. The experimental results for four microlenses with different aperture sizes demonstrate surface figure accuracy in the submicron range and surface roughness at the nanometer level. In addition, 3D profilometer scanning equipment was employed to measure the surface roughness of these microlens arrays, and the measurement results of these microlens arrays processed using the proposed method for their surface roughness are 18.4 nm, 29.6 nm, 34.4 nm, and 56.1 nm. Our findings indicate that this method holds great potential in microlens array fabrication, offering the ability to achieve lower linewidths and higher surface figure accuracy compared to conventional methods.

Fabrication of high integrated microlens arrays on a glass substrate for 3D micro-optical systems