Semiconductor research and applications have experienced a progressive reduction in dimensionality of structures from bulk, through quantum wells and wires to quantum dots (QDs). QDs provide an ultimate limit of charge carrier confinement. Their size is in the nanometer range, i.e. of the order of the exciton Bohr radius, giving rise to fully quantized confined electron and hole states. Their electronic properties differ significantly from those of systems with higher dimensionality and offer potential applications in novel optoelectronic devices. The most effective method for the fabrication of coherent, dislocation-free semiconductor QDs is the strained-layer epitaxy in the Stranski–Krastanow mode [1, 2]. Such self-organized transformation from two-dimensional layer-by-layer growth to a three-dimensional mode was found for many heterostructure systems. InAs quantum dots in GaAs matrix represent the best studied model system. The discrete energy states and the ease of integration into an optoelectronic device recently lead, e.g., to the presentation of electrically driven single photon sources [3]. Prerequisite for practical applications is the ability to control the electronic properties of the dot. Fabrication of quantum dots by applying Stranski-Krastanow growth is hampered by the action of entropy at growth temperature, usually leading to ensembles of dots which vary in size, shape, and composition. Consequently the energies of bound states vary within the ensemble. Since this growth mode still yields defect-free dots with superior electronic properties, the technique was recently advanced to improve the shape homogeneity within the ensemble and the integrity of the dot-matrix interfaces [4]. The development aimed to find a growth regime which simultaneously favors the formation of equilibrium-near dots with homogeneous composition and sharp interfaces. This chapter addresses the growth control of such particular kind of InAs dots in GaAs matrix and their electronic properties.