- Research Article
2
- 10.1149/2.006303ssl
Electrical Characteristics of TiTaO Thin Films Deposited on SiO2/Si Substrates by Magnetron Sputtering
- Jan 05, 2013
- ECS Solid State Letters
- S Salimy + 9 more +9
The regular down scaling in integrated circuits technologies stimulates the development of new solutions to increase the integrated circuit performances. Most efforts on size shrinking have been focused on active devices. Among technical solutions, the design and manufacturing of highly reliable integrated passive devices could be particularly relevant. Indeed, dielectrics thin films are used in a wide range of capacitive devices such as Metal Insulator Metal (MIM) capacitors, Metal Oxide Semiconductor (MOS) capacitor, gate for transistors and Memory applications or Radio Frequency Micro Electro MechanicalSystems(RFMEMS)switchingcapacitors.Theelectrical
Read more