- https://doi.org/10.1007/978-3-662-09901-8_27
Silicon Nitride in Epitaxy and Superlattices
- Jan 1, 1991
- Eberhard F. Krimmel +3 more
Abstract
Patterned or unpatterned silicon nitride films are used as masks in structured or unstructured, epitaxial or amorphous growth of semiconductor layers on single-crystal or amorphous substrates. The silicon nitride mask is stable compared to the conventionally used silicon oxide mask. Amorphous silicon nitride films are a constituent element of superlattice structures which are base materials for novel devices.
- # Amorphous Silicon Nitride Films
- # Silicon Nitride
- # Silicon Nitride Films
- # Amorphous Substrates
- # Epitaxial Growth Of Layers
- # Unpatterned Films
- # Materials For Devices
- # Growth Of Layers
- # Single-crystal Substrates
- # Element Of Structures
