This special issue of Journal of Physics: Condensed Matter contains a selection of invited and contributed papers presented at Symposium J: Synchrotron Radiation for Advanced Materials Analysis and Processing, part of the International Conference on Materials for Advanced Technologies 2003 (ICMAT 2003) and the International Union of Materials Research Societies International Conference in Asia 2003 (IUMRS-ICA 2003) which was held on 7–12 December 2003 in Singapore. ICMAT 2003 attracted more than 1500 participants and was graced by the presence of Nobel laureates Klaus von Klitzing and Sir Harry W Kroto who gave plenary and public lectures.One of 16 symposia, Symposium J brought together 54 researchers with various backgrounds from Asia, Australia, Europe and North America. In a relaxed and comfortable atmosphere, participants were presented 1 keynote and 17 invited papers, and 15 contributed oral talks as well as 21 posters covering diverse cutting-edge work made possible by exploiting synchrotron radiation. The relaxed atmosphere encouraged lively discussions.This special issue contains a variety of topics which are briefly described here with reference to the keynote and invited papers. H-D Nuhn paints a broad picture of the successful development of third-generation storage-ring-based synchrotron light sources and the ongoing projects aimed at building x-ray free electron lasers. Then, using photoemission, L I Johansson discusses the nature of the SiO2/SiC interface that is attracting keen interest for its significance for semiconductor manufacturing. Presenting photoelectron diffraction, E G Michel takes the same material and shows the solution of the atomic structure in the case of the (3×2) surface reconstruction of cubic SiC. S Lizzit describes the production of high-quality thin films of the inter-metallic superconductor MgB2 by molecular beam epitaxy and their characterization by photoemission, absorption spectroscopy, and low-energy electron diffraction. Using data obtained by simultaneous wide- and small-angle scattering as well as x-ray absorption spectroscopy, N Greaves gives a detailed explanation of how zeolites collapse when pressurized or heated. Moving on to polymers, H J Kim investigates surface capillary waves on polymer films via x-ray photon correlation spectroscopy. The growth of biological cells on polymer scaffolds is studied by P Thurner using micro-computed tomography with synchrotron radiation. S Cabrini gives an overview of the use of x-ray lithography to fabricate micro- and nano-devices for various applications. Finally, N Umesaki reports examples of applications of synchrotron radiation to characterize important industrial samples and processes.It is a special pleasure to acknowledge the strong and comprehensive help of co-chairs O Wilhelmi and P Yang and of Ms K L Chong. Many thanks as well to the members of the Scientific Committee who gave their advice, to the members of the Local Organizing Committee, the Session Chairmen, and the Exhibitors and Sponsors. Last, but not least, the effort of authors and referees as well as of the publisher to produce this special issue is greatly appreciated. Herbert O MoserSingapore Synchrotron Light Source, National University of Singapore e-mail: moser@nus.edu.sgChair: Symposium J, ICMAT 2003Scientific CommitteeH Dosch (Chair), MPI for Metal Research, GermanyS Baik, Pohang Light Source, KoreaG L Carr, NSLS, USAR J Cernik, Daresbury Laboratory, UKG N Greaves, University of Wales, Aberystwyth, UKS Kikuta, JASRI, JapanM Kovalchuk, RAS, RussiaZ H Mai, Beijing Synchrotron Radiation Facility, ChinaG Margaritondo, EPFL, SwitzerlandN Mårtensson, MAX Lab and University of Uppsala, SwedenT Matsushita, Photon Factory, JapanH O Moser, SSLS, SingaporeH Ohno, SPring-8, JapanH A Padmore, ALS, USAP Soukiassian, CEA and Université Paris-Sud, FranceA Stevenson, CSIRO, AustraliaW G Stirling, ESRF, FranceM Taniguchi, HISOR, JapanLocal Organizing CommitteeH O Moser (Chair), SSLS/NUSK L Chong, SSLS/NUSW S Sim, NUS/ChemistryA T S Wee, NUS/PhysicsO Wilhelmi, SSLS/NUSP Yang, SSLS/NUSExhibitorsFEIHecus M BraunM-O-TNanofilm Technologies InternationalRaithSponserPRIMA Research and Technologies
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