Ultrathin 90-degree sharp bends for spoof surface plasmon polaritons.

Transparent conductive electrodes, as transmission windows of photons and electrons, play important roles in high‐performance organic optoelectronic devices. The replacement of widely used indium tin oxide (ITO) electrodes has been attempted due to the increasing cost and intrinsically brittle characteristics of ITO. Ultrathin metal films, with excellent optoelectrical features, high flexibility, and sufficient mechanical stability, have been considered a potential candidate for the use as transparent conductive electrodes. However, ultrathin metal films follow the Volmer–Weber mechanism, resulting in a rough and discontinuous morphology with poor optoelectrical properties due to the bad adhesion to substrates. This review summarizes the progress in strategies for preparing ultrathin and ultrasmooth metal films with superior transmittance and conductivity by successfully suppressing the Volmer–Weber mechanism. The electrical and optical performances of the ultrathin metal films based on improved nucleation processes, as well as applications in ITO‐free organic optoelectronic devices, are also described and discussed in detail.

Plasmonic materials and metamaterials have been widely utilized to achieve spectral transmission, reflection and absorption filters based on localized or delocalized resonances arising from the interaction of photons with nanostructured materials. Realization of visible-frequency, high-performance, large-area, optical filters based on nanoplasmonic materials is rather challenging due to nanofabrication related problems (cost, fabrication imperfection, surface roughness) and optical losses of metals. Here, we propose and demonstrate large-area perfect absorbers and transmission filters that overcome difficulties associated with the nanofabrication using a lithography-free approach. We also utilize and benefit from the optical losses in metals in our optical filter designs. Our resonant optical filter design is based on a modified, asymmetric metal-insulator-metal (MIM) based Fabry-Perot cavity with plasmonic, lossy ultra-thin (~30 nm) metallic films used as the top metallic layer. We demonstrated a narrow bandwidth (~17 nm) super absorber with 97% maximum absorption with a performance comparable to nanostructure/nanoparticle-based super absorbers. We also investigated transmission (color) filters using ultra-thin metallic films, in which different colors can be obtained by controlling the dielectric spacer thickness. With performance parameters of transmission peak intensity reaching 60% and a narrow-band of ~ 40 nm, our color filters exceed the performance of widely studied plasmonic nanohole array based color filters. Proposed asymmetric Fabry-Perot cavities using ultra-thin metallic films could find applications in spectrally selective optical (color and absorber) filters, optoelectronic devices with controlled bandwidth such as narrow-band photodetectors, and light-emitting devices.

A novel compact spoof surface plasmonic (SSP) transmission line (TL) consisting of a stem-shaped periodic structure is proposed to achieve high field confinement in the higher frequency range (microwave to terahertz). The dispersion characteristic of the proposed stem-shaped SSP unit cell exhibits much lower asymptotic frequency and higher field confinement than the conventional coplanar waveguide (CPW) and the rectangular SSP unit cell structure without increasing the overall transverse dimension, i.e., improved signal propagation performance with reduced cross-sectional area. The numerical study of the multi-conductor line based on the proposed stem-shaped SSP unit cell shows that it has improved propagation and isolation features in comparison to the conventional TL structures. Here, the improved isolation is characterized in terms of the mutual coupling (MC) between the two adjacent lines designed using the stem-shaped SSP unit cell, which is not found to significantly increase with an increase in the coupling length unlikely in the conventional TLs. For the proposed SSP-based multi-conductor line, the MCs for 1.6, 2.25, and 4.15λ coupling lengths with fixed separation of 0.175λ are found to be 22, -19.8, and -17.55dB, respectively.

Substrate-mediated photoinduced chemical reactions on ultrathin metal films

Transparent electrodes (TEs) are the essential elements of many optoelectronic devices such as solar cells, touch screens, organic LEDs, and LCDs. Consequently demand for TEs is growing very steeply and the market value presently stands at 8 billion USDs. The state-of-art indium tin oxide (ITO) has an excellent trade-off between optical transparency and electrical sheet resistance but suffers from several drawbacks, mainly the increasing cost due to indium shortage, and inadequate flexibility due to poor mechanical ductility. This thesis presents the development of a new class of TEs based on ultrathin metal films (UTMFs). The work started from understanding the fundamental aspects of UTMF growth and properties, and then focused on different UTMF based geometries, composition, and combination for potential applications in different optoelectronic applications. Single component ultrathin Ni and Cr films were shown to possess significantly high transparency in the ultraviolet (175–400 nm) and mid-infrared (2.5–25 μm) regions making them viable TE for devices such as UV photodiodes, and IR pyroelectric detectors. The natural oxidation process, which is a major concern for metal films, has been exploited to achieve stable metallic films by inducing a protective oxide layer. In another proposed novel design, incorporating an ad hoc conductive grid, the sheet resistance of UTMFs can be reduced by more than two orders of magnitude with negligible loss in transparency, which in turn eliminates the inverse trade-off relationship between optical transparency and electrical conductivity of continuous metal based TEs. A TE structure based on the ultrathin conductive Cu films with an application specific functionalized capping layer of Ti or Ni layer has been demonstrated. The properties of the TE can be tuned accordingly and show excellent stability against temperature, and oxidation. The suitability of Ag-Cu alloy films as TE as an alternative to ITO has been also investigated. The optical spectrum of such alloy films follows the average optical behavior of single component Cu and Ag layers, thus resulting in a much flatter optical response in the visible region. UTMFs combined with Al doped ZnO (AZO), which is possible ITO replacement, has also been demonstrated to show the possibility of hybridizing the two technologies. A bilayer Ag/AZO has been developed which can overcome the high reflection of metals and retain their good electrical behavior, while maintaining a minimum total film thickness. In another structure, UTMF capping layer were used to improve the stability of AZO. It was found that an ultrathin oxidized Ni capping layer with a thickness at percolation threshold greatly enhances the stability of AZO layer in harsh environment without affecting the electro-optical properties

Activating technology of SnO 2 layers by metal particles from ultrathin metal films

Magnetism and surface structure of atomically controlled ultrathin metal films

Ultra-wideband spoof surface plasmon polaritons (SSPPs) based on compact balanced coplanar stripline (CPS) waveguides are proposed. Compared with the conventional CPS-based terahertz (THz) SSPP unit cell, the proposed one has achieved a size reduction of 55.2% under the condition of the same asymptotic frequency. The propagation and attenuation characteristics of the proposed SSPP waveguide can be easily manipulated by adjusting the geometry dimensions of the SSPP unit cell. It indicates that the cut-off frequency of the SSPP waveguide has its tunable flexibility thereby facilitating the filter design. To further validate the proposed idea, a similar topology in microwave regime is designed and measured, where the microwave feeding can be easily realized by embedding a balun structure from unbalanced microstrip line to balanced CPS. The measurement of the microwave filter prototype illustrates ultra-wideband bandpass filtering characteristics with return losses of over 10 dB and average insertion losses of 3.2 dB in the passband of 1.9-14 GHz. The presented work may have significant potentials to develop the miniaturization of various planar plasmonic devices and integrated circuits in microwave and THz regimes.

Field emission energy distribution of electrons from a thin metal film

By using lithium niobate (LiNbO3) as a defect layer, a tunable multilayer narrowband reflection-and-transmission filter containing an ultrathin metallic film is proposed. Due to the voltage dependence of the refractive index for LiNbO3, tunable optical filtering properties have been theoretically investigated based on the calculated wavelength-dependent reflectance and transmittance. The dependences of peak wavelength on the applied voltage and the angle of incidence are numerically illustrated. The results reveal that in addition to working as a tunable filter, it can also be expected to act as a refractometric optical sensor.

The coupling of light to collective oscillation of electrons on the metal surface allows the creation of surface plasmon-polariton wave. This surface wave is of central interest in the field of plasmonics. In this paper, we will present a brief review of this field, focusing on the plasmonic waveguide and plasmonic transmission. In the plasmonic waveguide, the light can be guided along the metal surface with subwavelength lateral dimensions, enabling the possibility of high-density integration of the optical elements. On the other hand, in the plasmonic transmission, the propagation of light through a metal surface can be tailored with the subwavelength holes, leading to the anomalous transmission behaviors which have received extensive investigations in recent years. In addition, as a supplement to plasmonics in the visible and near-infrared region, the study of THz plasmonics has also been discussed.

As an indispensable constituent of plasmonic materials/dielectrics for surface enhanced Raman scattering (SERS) effects, dielectrics play a key role in excitation and transmission of surface plasmons which however remain more elusive relative to plasmonic materials. Herein, different roles of vertical dielectric walls, and horizontal and vertical dielectric layers in SERS via 3D periodic plasmonic materials/dielectrics structures are studied. Surface plasmon polariton (SPP) interferences can be maximized within dielectric walls besieged by plasmonic layers at the wall thicknesses of integral multiple half‐SPPplasmonic material‐dielectric‐wavelength which effectively excites localized surface plasmon resonance to improve SERS effects by one order of magnitude compared to roughness and/or nanogaps only. The introduction of extra Au nanoparticles on thin dielectric layers can further enhance SERS effects only slightly. Thus, the designed Au/SiO2 based SERS chips show an enhancement factor of 8.9 × 1010, 265 times higher relative to the chips with far thinner SiO2 walls. As many as 1200 chips are batch fabricated for a 4 in wafer using cost‐effective nanoimprint lithography which can detect trace Hg ions as low as 1 ppt. This study demonstrates a complete generalized platform from design to low‐cost batch‐fabrication to applications for novel high performance SERS chips of any plasmonic materials/dielectrics.

As optoelectronic devices continue to improve, control over film thickness has become crucial, especially in applications that require ultra-thin films. A variety of undesired effects may arise depending on the specific growth mechanism of each material, for instance a percolation threshold thickness is present in Volmer-Webber growth of materials such as silver. In this paper, we explore the introduction of aluminum in silver films as a mechanism to grow ultrathin metallic films of high transparency and low sheet resistance, suitable for many optoelectronic applications. Furthermore, we implemented such ultra-thin metallic films in Dielectric/Metal/Dielectric (DMD) structures based on Aluminum-doped Zinc Oxide (AZO) as the dielectric with an ultra-thin silver aluminum (Ag:Al) metallic interlayer. The multilayer structures were deposited by magnetron sputtering, which offers an industrial advantage and superior reliability over thermally evaporated DMDs. Finally, we tested the optimized DMD structures as a front contact for n-type silicon solar cells by introducing a hole-selective vanadium pentoxide (V2O5) dielectric layer.

Ultrathin Metal Films on Top of SAMs

Metallic glasses typically fail in a brittle manner through shear band propagation but can exhibit significant ductility when the sample size is reduced below a few hundreds of nanometers. To date the size effect was mainly demonstrated for free-standing samples and the role of extrinsic setup parameters on the observed behavior is still under debate. Therefore, in the present work we investigated the mechanical properties of polymer-supported sputtered amorphous Pd82Si18 thin films with various thicknesses. We show that the films exhibit brittle fracture for thicknesses far below 100 nm. A pronounced size effect resulting in extended crack-free deformation up to 6% strain was observed only in films as thin as 7 nm – a thickness which is lower than the typical shear band thickness. This size effect results in exceptional cyclic reliability of ultrathin metallic glass films which can sustain cyclic strains of 3% up to at least 30,000 cycles without any indication of fatigue damage or electrical conductivity degradation. Since the enhancement of mechanical properties is observed at ambient conditions using inexpensive substrates and an industrially scalable sputter deposition technique, a new research avenue for utilization of ultrathin metallic glasses in microelectronics, flexible electronics or nanoelectromechanical devices is opened up.