- Research Article
- 10.1016/j.jvir.2026.108750
Angioplasty of Cephalic Arch Stenosis in Patients Enrolled in the AVeNEW Trial: Post Hoc Analysis of 730-Day Primary Patency and Restenosis Patterns.
- Mar 20, 2026
- Journal of vascular and interventional radiology : JVIR
- Guilherme Strieder De Oliveira + 2 more +2
To assess patency and characterize anatomical patterns of restenosis following percutaneous transluminal angioplasty (PTA) of cephalic arch stenosis (CAS) from patients with hemodialysis arteriovenous fistulas who were enrolled in the ArterioVeNous Stent Graft in the TreatmEnt of Venous OutfloW Stenosis in Arteriovenous Fistula Access Circuits (AVeNEW) trial. Among 280 patients enrolled in AVeNEW, patients with CAS randomized to PTA were identified. Clinical data and fistulograms were reviewed through 730 days. Kaplan-Meier curves were used to estimate target lesion primary patency (TLPP) and access circuit primary patency (ACPP). The cephalic vein arch was segmented into 3 regions: proximal, arch, and terminus. Recurrence patterns were characterized by comparing the site of index stenosis with the site of restenosis using Sankey diagrams. Seventy patients with CAS were treated with PTA. Two ruptures and 2 unsuccessful PTAs yielded a modified intention-to-treat group of 66 patients. TLPP and ACPP were equivalent at the 180-, 365-, and 730-day time points: 39.5%, 13.2%, and 5.6%, respectively. Regarding post-PTA restenosis, 15 patients were censored, leaving 51 patients for analysis. Terminus stenoses recurred at the terminus. Arch region stenoses often recurred in the arch region; however, 6 (20%) of 30 formed a new terminus stenosis. PTA has a high technical successful rate for treating CAS; however, TLPP and ACPP were poor; their equivalence indicates CAS drives circuit failure. Recurrence at the index site of stenosis was the most common, although PTA of stenosis in the arch region induced a new site of stenosis at the terminus region in some patients. Proximal stenoses exhibited variable recurrence patterns.
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