- Research Article
- 10.1021/acsomega.4c11482
Oxidation and ChlorinationReaction Characteristics:A Density Functional Theory Perspective toward the Fundamental Understandingof Etching of Ruthenium and Tantalum Surfaces
- Mar 01, 2026
- ACS Omega
- Pradeep R Varadwaj + 2 more +2
Given the profound industrial relevance of metal surfaceetching,we performed a detailed density functional theory investigation ofthe nature of intermolecular interactions between the O2 (and Cl2) etchant(s) and the ruthenium (Ru) (and tantalum(Ta)) surface(s). We assessed the formation energies of the MOx and MClx familiesof molecular entities (where M denotes Ta or Ru and x spans from 1to 6), in the gas phase, along with the landscapes of adsorption anddesorption energies for Ox/MOx and Clx/MClx on the metal surfaces, to offer valuable insightsinto the energy profiles required for the fundamental understandingof O2- and Cl2-plasma environments. Our findingsunveil that molecular RuO4 may stand out as a prime byproductfor etching the Ru surface when exposed to the O2-plasma,while etching Ru by the Cl2 plasma is much more energeticallychallenging. Conversely, TaCl3, TaCl4, and TaCl5 may emerge as the predominant etching byproducts for theTa surface in the Cl2 plasma environment. The climbingimage nudged elastic band calculations carried out for analyzing detailedetching reaction paths reveal that the desorption of RuO4 from the Ru surface is a rate-limiting phenomenon, characterizedby the formation of a metastable intermediate state [RuRuO4], effectively reducing the energy needed for etching.
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