TopGaN (Poland)

The design and fabrication of a gallium nitride (GaN) based distributed feedback (DFB) laser diode (LD) with 3<sup xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">rd</sup> order sidewall gratings is demonstrated here. The aim is to provide a compact, narrow-linewidth light source for the cooling transition in strontium optical atomic clocks, which requires high accuracy in emission wavelength. These devices also have key roles to play in optical communications, sensing and medical applications.

The growth of high In content InGaN material is notorious for being challenging because of high mechanical strain and thermodynamic instability of the system. It has been shown that one can improve the growth quality by using variable surface miscut. In this study, we demonstrate the use of micropatterning of bulk GaN substrates in order to improve the quality of high In content layers. During MOVPE growth the quality of the InGaN layers and the In content depends on the local shape of the substrate surface, reaching the highest emission intensity at the top of every pattern. We study patterns with characteristic sizes ranging from 1 to 6 µm created using two methods: binary photolithography combined with a thermal reflow process as well as multilevel photolithography. The latter allows for achieving lower inclination of the sidewall of the pattern which in turn supports a more stable growth process. The properties of the samples are studied using fluorescence microscopy, microphotoluminescence mapping and carrier diffusion measurements.

The main objective of this work is to demonstrate and validate the feasibility of fabricating (Al, In) GaN laser diodes with etched facets. The facets are fabricated using a two-step dry and wet etching process: inductively coupled plasma—reactive ion etching in chlorine, followed by wet etching in tetramethylammonium hydroxide (TMAH). For the dry etching stage, an optimized procedure was used. For the wet etching step, the TMAH temperature was set to a constant value of 80 °C, and the only variable parameter was time. The time was divided into individual steps, each of 20 min. To validate the results, electro-optical parameters were measured after each step and compared with a cleaved reference, as well as with scanning electron microscope imaging of the front surface. It was determined that the optimal wet etching time was 40 min. For this time, the laser tested achieved a fully comparable threshold current (within 10%) with the cleaved reference. The described technology is an important step for the future manufacturing of photonic integrated circuits with laser diodes integrated on a chip and for ultra-short-cavity lasers.

Miniaturisation of laser sources is crucial to the translation of quantum technologies from the laboratory to the real world. Typically, the lasers required for cooling and trapping of atoms and ions make up a significant footprint of the measurement system. Increasing robustness and reliability whilst removing noise sources is a key challenge whilst reducing volume. Direct generation GaN based external cavity diode lasers offer lower SWaP-C compared to traditional frequency doubled alternatives. Butterfly packaged single frequency sources operation in the blue - UV allow numerous atomic transitions including Sr, Sr+, Yt, Yb+, Mg and Ca to be targeted.

Quantum technologies containing key GaN laser components will enable a new generation of precision sensors, optical atomic clocks and secure communication systems for many applications such as next generation navigation, gravity mapping and timing since the AlGaInN material system allows for laser diodes to be fabricated over a wide range of wavelengths from the u.v. to the visible. We report our latest results on a range of AlGaInN diode-lasers targeted to meet the linewidth, wavelength and power requirements suitable for optical clocks and cold-atom interferometry systems. This includes the [5s²S_1/2-5p²P_1/2] cooling transition in strontium⁺ ion optical clocks at 422 nm, the [5s₂¹S₀-5p¹P₁] cooling transition in neutral strontium clocks at 461 nm and the [5s²s_1/2 – 6p²P_3/2] transition in rubidium at 420 nm. Several approaches are taken to achieve the required linewidth, wavelength and power, including an extended cavity laser diode (ECLD) system and an on-chip grating, distributed feedback (DFB) GaN laser diode.

In this chapter, we recall briefly the history of nitride semiconductor laser diodes and the main technical and scientific challenges related to their development and future perspective. We describe in more detail the recently emerged distributed feedback (DFB) nitride laser diodes and their possible applications. We also address devices that are less known but closely related to laser diodes such as superluminescent diodes and optical amplifiers, the latter ones being components needed for advanced visible light photonic systems.

Owing to increased performance capabilities over their LED counterparts, Gallium Nitride (GaN) based Laser Diodes (LDs) are becoming more prevalent in several applications, including lighting, visible light communications, medical spectroscopy, and atom cooling. For many of these applications, a tunable, precise wavelength is necessary such that chromatic aberrations are minimized and that specific wavelengths with narrow linewidth can be utilized for atomic transitions or filtered communications systems. This paper discusses one method of achieving single-mode lasing operation in GaN LDs, namely the deeply-etched sidewall grating Distributed Feedback (DFB) LD. Optical characteristics of such devices will be discussed, as well as their feasibility for optical communications.

Superluminescent diodes represent a device type which can fill the gap between light emitting diodes (LEDs) and laser diodes. The light generation based on Amplified Spontaneous Emission promotes high brilliance of the light source (better than in case of LEDs), and by this efficient light harnessing e.g. coupling to optical fibers. At the same time the low time coherence of the light reduces the interference effects, unfavorable in applications such as Optical Coherence Tomography or in direct image projection. This article reviews the development process and the current status of nitride superluminescent diodes, from their first introduction in 2009 until present.

Gallium nitride (GaN) sources are becoming a regular part of today's world and are now key devices for lighting infrastructures, communications systems and quantum applications, amongst others. In particular, many applications have seen the shift from LEDs to laser diodes to make use of higher powers, higher bandwidths and increased transmission distances. Laser communication systems are well established, however there are applications where the ability to select a single emitted wavelength is highly desirable, such as quantum atomic clocks or in filtered communication systems. Distributed feedback (DFB) lasers have been realised emitting at a single wavelength where the grating structure is etched into the sidewall of the ridge. The main motivation in developing these lasers is for the cooling of ions in atomic clocks; however their feasibility for optical communications is also explored. Narrow linewidth lasers are desirable and this paper will explore how this is achieved. Data rates in excess of 1 Gbit/s have also been achieved in a directly modulated, unfiltered system. These devices lend themselves towards wavelength division multiplexing and filtered optical communications systems and this will be analysed further in the work presented here.