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  • https://doi.org/10.1116/1.1823438Copy DOI Icon

DNA nanopatterning with self-organization by using nanoimprint

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Abstract

Recently, DNA properties have been investigated to realize new functional biodevices. However, there are few reports on DNA nanopatterning to make bionanodevices. Therefore, we have attempted DNA nanopatterning by using a nanoimprint method. On a glass substrate coated with poly-L-lysine, which is known as a material for DNA immobilization by UV radiation, about 100 μl of a 1μg∕μl DNA solution was applied and was dried at 60 °C for an hour, and was irradiated by UV for 2 min. Further 4% polyvinyl alcohol (PVA) solution was coated on the substrate. The substrate was imprinted at 100 °C and 6 MPa for 5 min, and a mold was applied with a SiO2 on Si substrate fabricated by electron-beam lithography and dry etching. Etching of the DNA substrate was done by reactive ion etching in O2 atmosphere. Finally, the PVA layer washed down by water, and the DNA nanopatterning was obtained.

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