- Research Article
- 10.1149/ma2025-01311592mtgabs
Ferroelectric Hf0.5Zr0.5O2 Memcapacitor Array for in-Memory Computing
- Jul 11, 2025
- Electrochemical Society Meeting Abstracts
- Jiyoung Kim + 3 more +3
The rapid progress in artificial intelligence (AI) is driving the need for more efficient computing architectures capable of performing the demanding, repetitive computations required for processing large datasets. Unlike traditional von Neumann architectures, which separate processing and memory units, new approaches aim to integrate computational capabilities directly into memory arrays, facilitating in-memory computing (IMC). This integration significantly improves both energy efficiency and processing speed, particularly for AI and similar applications. A crucial operation within IMC is vector-matrix multiplication (VMM), where input signal vectors interact with a memory state matrix to produce output signal vectors.One innovative approach to implementing VMM is through the use of a ferroelectric Hf₀.₅Zr₀.₅O₂ (HZO) layer in conventional field-effect transistor (FET) or metal-insulator-metal (MIM) devices. These HZO-based ferroelectric components show significant promise for low-power, IMC-compatible systems, especially when integrated into MIM capacitor structures. Their simple fabrication process supports scalable system integration, while offering benefits such as low power consumption and high reliability. However, current IMC techniques utilizing ferroelectric MIM capacitors rely on small-signal capacitance readout, which suffers from limited contrast between high and low capacitance states, making it difficult to distinguish memory states effectively for efficient IMC operations.In this study, we introduce two novel readout techniques to improve the scalability and robustness of IMC, focusing on enhanced memory differentiation by reading the ferroelectric remanent polarization (Pᵣ) instead of relying on small-signal capacitance. These methods exploit the switching behavior between two stable polarization states (Pₗₒʷ and Pᵤₚ) of the HZO material. To measure charge accumulation resulting from polarization switching, we connect the ferroelectric HZO capacitors in series with either a shunt resistor (Rₛₕᵤₙₜ) or an external capacitor (Cₑₓt) to produce current or voltage signals, respectively. Both readout methods show significantly improved memory differentiation and VMM performance compared to the traditional small-signal capacitance approach. For example, in the current readout method, the maximum displacement current in the high-current state (Iₛʷ + Iₙₒₙ-ˢʷ) is approximately 0.31 mA, while the low-current state (Iₙₒₙ-ˢʷ) is about 0.04 mA when no switching current is present. Notably, the static leakage current during the input pulse is nearly zero, underscoring the potential for low-power operation in capacitive systems. In the voltage readout method, an initial Pᵤₚ state leads to a high output voltage (Vₒᵤₜ) of approximately 0.13 V, while an initial Pₗₒʷ state produces a low Vₒᵤₜ of about 0 V. These polarization-based readout techniques provide substantially higher memory distinction and better VMM performance compared to traditional small-signal capacitance methods.We will demonstrate IMC systems by using voltage readout of the Pr change in HZO layers, employing charge compensation between the Cext and HZO capacitors. This method takes advantage of the superior memory distinction within the capacitive system, offering more reliable and lower-power performance compared to traditional Fe-FET approaches.The authors acknowledge Prof. Joseph S. Friedman and Dr. Peng Zhou for the technical discussion.
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