Multicast Test Architecture and Test Scheduling for Interposer-Based 2.5D ICs

Through-silicon via (TSV) based 3D integrated circuit (IC) testing is promising area to the researchers in modern day semiconductor industry. The manufacturing of 3D ICs may produce TSV defects which reduce yield. Recent work has proposed grouping of functional and redundant TSVs such that the faulty functional TSVs are supported by redundant TSVs and multiplexers (MUXs) are used to implement that group. This paper proposes grouping of functional and redundant TSVs such that a functional TSV is supported by redundant TSVs of other groups. We have presented an algorithm that finds the best grouping of functional and redundant TSVs such that maximum recovery of functional TSVs can be achieved with a given number of MUXs.

Core based three-dimensional(3D) integrated circuits (ICs) design is an emerging field of semiconductor industry that promises greater number of devices on chip, increased performance and reduced power consumption. But due to scaling in technology features these chips are more complex and hence testing of these 3D ICs is a challenging task. This paper follows a P1500-style wrapper design for 3D ICs using through silicon vias (TSVs) for testing purpose. It is assumed that the core elements are distributed over several layers of the ICs. As the number of available TSVs are limited due to small chip area, this work is intended to design balanced wrapper chains using available TSVs. In this work we have proposed a polynomial time algorithm of O(N) to design the test wrapper. The results are presented based on the ITC'02 SOC test benchmarks and compared with prior work. Obtained results show that our algorithm provides better utilization of TSVs compared to the work presented in.

Three-dimensional (3D) integration using through-silicon via (TSV) is an emerging technique for integrated circuit (IC) designs. A 3D IC consists of multiple dies vertically connected by TSVs. To ensure the yield of 3D ICs, each die should be tested before it is stacked, i.e., the pre-bond test. Typically, test pads are implemented in the die under test for the pre-bond test due to the limitation of current probing technologies. However, the additional test pads incur additional die area. In this paper, therefore, we propose a test cost optimization technique for the pre-bond test of 3D ICs. This technique attempts to minimize the number required power pads of each die in a wafer and the overall test time of the wafer. Simulation results show that reducing power pads can effectively reduce the number of required test pads and the wafer test time.

Convergence and miniaturization of consumer electronic products such as cameras, phones, etc. has been driven by enhanced performance and reduced microelectronics size. For past few decades Moore’s law has been driving the microelectronics industry to achieve high performance with small form-factors at a reasonable cost. While the continued miniaturization of the transistors has resulted in unparalleled growth of the electronics industry, further performance increment via size scaling could be cost-ineffective and difficult to manufacture. To satisfy the current/future integrated Circuit (IC) package requirements, vertical integration of chips holds the key, i.e., 3-D packaging. Chip-stacking (3-D) is emerging as a powerful technology to reduce package footprint, decrease interconnection power, higher frequencies, and provide efficient integration of heterogeneous devices. It allows further reduction in the form factor of current systems and eases the interconnect performance limitation since the components are integrated on top of each other instead of side-by-side, resulting in shorter interconnect lengths. Due to high package density and chip-stacking on top of each other, heat dissipation from the stacked chips becomes a concern. To overcome these thermal challenges and provide shorter/faster inter-chip electrical connection, Through Silicon Via (TSV) technology is being implemented in 3-D ICs. TSVs allow 3-D chips to be interconnected directly and provide high speed signal propagation. TSVs provide inter-chip heat/current path but the current flowing through the TSVs results in localized heat generation (Joule Heating) within the silicon, which could be detrimental to the overall performance of the system. In this paper, the effect of Joule heating on the device performance measured by trans-conductance, electron mobility (e− mobility), and channel thermal noise is analyzed. Thinned (100 μm) chips with a uniform power map and evenly distributed TSVs are analyzed in this work. Thermal distribution in the package is studied for different TSV currents including a base-line case of no-current (thermal TSV only) and the junction temperature is determined for each case. The response from the thermal analysis is correlated to the device performance through existing relations. Results indicate that joule heating has a significant effect on the thermal response of the 3D IC and subsequently proves to be detrimental to the chip performance. An understanding of the electrical performance dependence on TSV joule heating is developed through this work.

<p>Information technology-to-internet of things may have succeeded because of fast silicon chip capability expansion. Moore's law, which reduces device size, boosted integrated circuit (IC) performance. Delay rises with highdensity connection parasitic capacitance. Interconnect delays have surpassed transistor delays and slowed progress. An alternative is required now to reduce connection latency. The third dimension is used in popular 3D IC technology IC technology requires through silicon via (TSV) for signal integrity and heat mitigation. Noise coupling hinders electrical communication between signal-carrying TSVs (aggressive TSVs) and ground TSVs (victim TSVs), a 3D IC bottleneck. TSVs must be dielectrically insulated from Si substrates to avoid electrical signal interference. Additionally, first-order modelling will confirm the suggestions. This article proposes using the nanosheet field effect transistor (NSFET) to overcome 3D IC noise coupling and complementary metal oxide semiconductor (CMOS) technology nodes. After discussing the electronic industry and sub nm, several basic metrics and criteria for developing electronic components are presented. The first technique uses Perylene-N's exceptional noise-cancelling characteristics. Second technique uses electrical TSV (ETSV), thermal TSV (TTSV), and heat source models to measure noise coupling on numerous ICs. The third proposes many noise-reducing materials. The suggested structures outperform traditional approaches.</p>

Purpose This paper aims to develop the thermal resistance network model based on the heat dissipation paths from the multi-die stack to the ambient and takes into account the composite effects of the thermal spreading resistance and one-dimensional (1D) thermal resistance. The thermal spreading resistance comprises majority of the thermal resistance when heat flows in the horizontal direction of a large plate. The present study investigates the role of determining the temperature increase compared to the thermal resistances intrinsic to the 3D technology, including the thermal resistances of bonding layers and through silicon vias (TSVs). Design/methodology/approach This paper presents an effective method that can be applied to predict the thermal failure of the heat source of silicon chips. An analytical model of the 3D integrated circuit (IC) package, including the full structure, is developed to estimate the temperature of stacked chips. Two fundamental theories are used in this paper – Laplace’s equation and the thermal resistance network – to calculate 1D thermal resistance and thermal spreading resistance on the 3D IC package. Findings This paper provides a comprehensive model of the 3D IC package, thus improving the existing analytical approach for predicting the temperature of the heat source on the chip for the 3D IC package. Research limitations/implications Based on the aforementioned shortcomings, the present study aims to determine if the use of an analytical resistance model would improve the handling of a temperature increase on the silicon chips in a 3D IC package. To achieve this aim, a simple rectangular plate is utilized to analyze the temperature of the heat source when applying the heat flux on the area of the heat source. Next, the analytical model of a pure plate is applied to the 3D IC package, and the temperature increase is analyzed and discussed. Practical implications The main contribution of this paper is the use of a simple concept and a theoretical resistance network model to improve the current understanding of thermal failure by redesigning the parameters or materials of a printed circuit board. Social implications In this paper, an analytical model of a 3D IC package was proposed based on the calculation of the thermal resistance and the analysis of the network model. Originality/value The aim of this work was to estimate the mean temperature of the silicon chips and understand the heat convection paths in the 3D IC package. The results reveal these phenomena of the complete structure, including TSV and bump, and highlight the different thermal conductivities of the materials used in creating the 3D IC packages.

As the design complexity increases, three-dimensional (3D) integrated circuit (IC) design has become an industry trend. However, the testing of a 3D IC is a design challenge. In addition to minimize the test application time (including pre-bond testing and post-bond testing), the number of test pads of each layer should also be taken into account. In this paper, we propose an integer linear programming (ILP) approach to perform the 3D IC test scheduling with test pads considered. Different from those previous works, our objective is to minimize the weighted sum of the test application time and the number of required test pads. Experimental results consistently show that our approach works well in practice.

Thermal issue is the leading design constraint for 3-D stacked integrated circuits (ICs) and through silicon vias (TSVs) are used to effectively reduce the temperature of 3-D ICs. Normally, TSV is considered as a good thermal conductor in its vertical direction, and its vertical thermal resistance has been well modeled. However, lateral heat transfer of TSVs, which is also important, was largely ignored in the past. In this paper, we propose an accurate physics-based model for lateral thermal resistance of TSVs in terms of physical and material parameters, and study the conditions for model accuracy. For TSV arrays or farm, we show that the space or pitch between TSVs has a significant impact on TSV thermal behavior and should be properly considered in the TSV models. The proposed lateral thermal resistance model is fully compatible with the existing modeling approaches, and thus we could build a more accurate complete TSV thermal model. The new TSV thermal model can be easily integrated into a finite difference (FD) based thermal analysis framework to improve analysis efficiency. The accuracy of the model is validated against a commercial finite element tool-COMSOL. Experimental results show that the improved TSV thermal model (with proposed lateral thermal model) could greatly improve the accuracy of FD method in thermal simulation comparing with the existing method.

New electronic devices with small size and low power consumption are in demand in recent years. Miniaturization and complex product are required in modern electronics for more functionality in the smaller electronic package. To overcome such issues, 3D packages or package on package (PoP) are introduced. The 3D packaging is stacking of chip on top of another which is emerging as a powerful technology that satisfies such integrated circuit (IC) package demands. A 3D package using through silicon vias (TSVs) has emerged as an effective technology for future interconnection requirements. The mismatch of coefficient of thermal expansion (CTE) of the SiO2 and copper used in TSV can induce a lot of thermal stresses. The stress developed at interfaces results in the interfacial delamination of TSV, which is mainly driven by a shear stress concentration at the point. The developed thermal stresses are critical for the thermo-mechanical reliability of the 3D package. In this paper, the effect of package structure on the failure metric of the 3D package has been studied. J-integral has been used to quantify the crack driving force. The crack is modeled at the TSV and BEOL (Back End of the Line) and the die-substrate thickness is varied and studied during chip attachment process and under thermal cycling load for optimizing the die and substrate thickness design [1]. Finite Element method have been used to analyze the thermo-mechanical stresses and fracture parameters in TSV structures 3D package. For this study, full field compact modeling methodology [2] has been leveraged for the ease of FEA using ANSYS Workbench 17.2. An optimized package assembly was obtained to reduce the crack driving energy at the TSV region and in the BEOL dielectric layer. A design approach has been proposed to mitigate brittle failure issues thus improving the thermo-mechanical reliability of the 3D package.

Through silicon via (TSV) based 3D integrated circuits have inspired a novel design paradigm which explores the vertical dimension, in order to alleviate the performance and power limitations associated with long interconnects in 2D circuits. TSVs enable vertical interconnects across stacked and thinned dies in 3D-IC designs, resulting in reduced wirelength, footprint, faster speed, improved bandwidth, and lesser routing congestion. However, the usage of TSVs itself gives rise to many critical design challenges towards the minimization of chip delay and power consumption. Therefore, realization of the benefits of 3D ICs necessitates an early and realistic prediction of circuit performance during the early layout design stage. The goal of this thesis is to meet the design challenges of 3D ICs by providing new capabilities to the existing floorplanning framework [87]. The additional capabilities included in the existing floorplanning tool is the co-placement of TSV islands with circuit blocks and performing non-deterministic assignment of signals to TSVs. We also replace the wirelength and number of TSVs in the floorplanning cost function with the total delay in the nets. The delay-aware cost function accounts for RC delay impact of TSVs on the delay of individual signal connection, and obviates the efforts required to balance the weight contributions of wirelength and TSVs in the wirelength-aware floorplanning. Our floorplanning tool results in 5% shorter wirelength and 21% lesser TSVs compared to recent approaches. The delay in the cost function improves total delay in the interconnects by 10% - 12% compared to wirelength-aware cost function. The influence of large coupling capacitance between TSVs on the delay, power and coupling noise in 3D interconnects also offers serious challenges to the performance of 3D-IC. Due to the degree of design complexity introduced by TSVs in 3D ICs, the importance of early stage evaluation and optimization of delay, power and signal integrity of 3D circuits cannot be ignored. The unique contribution of this work is to develop methods for accurate analysis of timing, power and coupling noise across multiple stacked device layers during the floorplanning stage. Incorporating the impact of TSV and the stacking of multiple device layers within floorplanning framework will help to achieve 3D layouts with superior performance. Therefore, we proposed an efficient TSV coupling noise model to evaluate the coupling noise in the 3D interconnects during floorplanning. The total coupling noise in 3D interconnects is included in the cost function to optimize positions of TSVs and

The three-dimensional (3D) integration technology using through silicon via (TSV) provides many benefits over the 2D integration technology. Although many different manufacturing technologies for 3D integrated circuits (ICs) have been presented, some challenges should be overcome before the volume production of 3D ICs. One of the challenges is the testing of 3D ICs. This paper proposes test integration interfaces for controlling the design-for-test circuits in the dies of a 3D IC. The test integration interfaces can support the pre-bond, known-good stack, and post-bond tests. The minimum number of required test pads of the proposed test interface for pre-bond test using is only four. Furthermore, the test interface is compatible with the IEEE 1149.1 standard for the board-level testing. Simulation results show that the area overhead of the proposed test interfaces for a 3D IC with two dies in which each die implements the function of ITC’99 b19 benchmark is only about 0.15%.

The author addresses the question of knowledge transfer between industry and academy in the area of integrated-circuit (IC) testing. He first examines the movement of theory from academia to industrial practice, finding two problems: designers are evaluated on meeting deadlines not on testability; and most designers do not know how to ensure testability in a systematic fashion. The solutions are technological-implementation of either design rules and design-rule checkers to guarantee testability or the use of testability measure programs-and educational, i.e. teaching design for testability as an integral part of logic design. The author then discusses the problems of teaching the relevance of theory to current industrial practice at the University ball. He finds more problems and lists the causes of the irrelevance of theory, including industry-university consulting policies, funding mechanisms that depend on peer review, and the frequent difficulty of determining the relevance of novel theory before its industrial applications.< <ETX xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">&gt;</ETX>

The low throughput at IC (integrated circuit) testing is mainly due to the increasing test data volume, which leads to high ATE (automatic test equipment) memory requirements and long test application times. In contrast to previous approaches that address either test data compression or abort-on-fail testing, we propose an architecture for combined test data compression and abort-on-fail testing. The architecture improves throughput through multi-site testing as the ATE memory requirement is constant and independent of the degree of multi-site testing. For flexibility in modifying the test data at any time, we make use of a test program for decompression; only test independent evaluation logic is added to the IC. Major advantages compared to MISR (multiple-input signature register) based schemes are that our scheme (1) allows abort-on-fail testing at clock-cycle granularity, (2) does not impact diagnostic capabilities, and (3) needs no special care for the handling of unknowns (X).

Through-silicon vias (TSVs) are essential for 3D integrated circuits (ICs) and advanced chiplet packaging. The semiconductor industry is transitioning toward 3D ICs, chiplets, and system-in-package (SiP) solutions due to the slowdown of Moore’s Law and limitations in conventional silicon scaling. In this paper, we propose an optimized TSV architecture for high-frequency transmission to enhance its suitability for 6G communication chips, and develop a comprehensive equivalent circuit model for fault-free and faulty TSVs. This model accounts for open-circuit and short-circuit fault conditions while considering the effects of higher frequencies, substrate type, doping concentration, and adjacent layers. At the physical level, the TSVs are simulated using the Ansys High-Frequency Structure Simulator (HFSS), and the equivalent circuits are designed using the Cadence Virtuoso tool. An experimental evaluation is also conducted to validate the physical design. We position the TSVs in a pattern of ground-signal-ground (G-S-G) to reduce the effective inductance of the signal TSV, thereby minimizing inductive reactance at ultra-high frequencies. Consequently, the reflection coefficient remains below -10 dB across the frequency range of 0.1 to 146.3 GHz. Furthermore, we compare simulation outcomes from HFSS and Cadence for both fault-free and faulty TSVs under varying operating conditions. Additionally, the parasitic circuit components are characterized through extensive theoretical derivations for in-depth circuit verification. Collectively, the rigorous analysis, experimental validation, and thorough investigation of the proposed design and its equivalent circuit demonstrate their potential for use in creating datasets for a fault prediction machine learning model.

In three-dimensional (3D) integrated circuit (IC), a large number of dummy through silicon vias (TSV) are required for thermal and thinning concerns. However, limited attention is paid to the fact that these dummy TSVs can be multi-functional and used for purposes. In this paper, we propose to use those timing wasteful dummy TSVs to replace bit line delay cells. Also, a TSV allocation algorithm is presented to optimize the TSV array layout. Finally, three memory designs are implemented to verify the feasibility and reliability of the proposed technology. It is found that all delay cells in these 3 memories can be replaced by TSV arrays.